Nickel film orientation change by nitrogen ion bombardment during deposition

Vacuum

Volumn 48, Issue 7-9, 1997, Pages 705-708

  Popovic N ^a   Dimitrijevic T ^a   Bogdanov, Z ^a   Goncic B ^a   Strbac S ^b   Rakocevic Z ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b UNIVERSITY OF BELGRADE   (Serbia)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; DEPOSITION; FILM GROWTH; ION BOMBARDMENT; METALLIC FILMS; METALLOGRAPHIC MICROSTRUCTURE; MORPHOLOGY; NITROGEN; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE; X RAY DIFFRACTION ANALYSIS;

ELECTRON BEAM TRIODE ION PLATING;

NICKEL PLATING;

EID: 0031222542     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(97)00035-3     Document Type: Article

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