Effects of deposition parameters on the texture of chromium films deposited by vacuum arc evaporation

Thin Solid Films

Volumn 289, Issue 1-2, 1996, Pages 34-38

  Gautier, C ^a   Machet, J ^a  

^a UNIVERSITY OF LIMOGES   (France)

Author keywords

Chromium; Coatings; Deposition process; Physical vapour deposition (PVD)

Indexed keywords

CRYSTAL IMPURITIES; CRYSTAL STRUCTURE; DEPOSITION; EVAPORATION; GRAIN SIZE AND SHAPE; TEMPERATURE; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ARC CURRENT; ARGON PRESSURE; BIAS VOLTAGE; CHROMIUM FILM; DEPOSITION PARAMETER; SCHERRER METHOD; VACUUM ARC EVAPORATION;

CHROMIUM;

EID: 0030290398     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)08891-8     Document Type: Article

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