CNx film characterization by surface sensitive methods: XPS and XAES

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 601-604

  Dementjev, A P ^a   De Graaf, A ^b   Dolgiy, D I ^a   Olshanski, E D ^a   Shulga, Y M ^c   Serov, A A ^a  

^a KURCHATOV INSTITUTE   (Russian Federation)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^c SEMENOV INSTITUTE OF CHEMICAL PHYSICS   (Russian Federation)

Author keywords

C3N4; Electron spectroscopy; Implantation; Nitrides

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; FILM PREPARATION; ION IMPLANTATION; MOLECULAR STRUCTURE; STOICHIOMETRY; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; X-RAY EXCITED AUGER ELECTRON SPECTROSCOPY (XAES);

NITRIDES;

EID: 0032622101     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00356-2     Document Type: Article

References (13)

1. Liu A.Y., Cohen M.L. Phys. Rev. B. 41:1990;10727.
2. Hoffman A., Brener R., Gouzman I., Cytermann C., Geller H., Levin L., Kenny M. Diamond Relat. Mater. 4:1995;292.
3. Boyd K.J., Marton D., Todorov S.S., Al-Bayati A.H., Kulik J., Zuhr R.A., Rabalais J.W. J. Vac. Sci. Technol. A. 13(4):1995;2110.
4. Sharma A.K., Ayyub P., Maltani M.S., Adhi K.P., Ogale S.B., Sunderaraman M., Upadhyay D.D., Banerjee S. Appl. Phys. Lett. 69:1996;3489.
5. C Chen L., Yang C.Y., Bhusari D.V., Chen K.H., Lin M.C., Lin J.C., Chuang T.J. Diamond Relat. Mater. 5:1996;514.
6. Spaeth C., Kuhn M., Kreissig U., Richter F. Diamond Relat. Mater. 6:1997;626.
7. Ripalda J.M., Montero I., Galan L. Diamond Relat. Mater. 7:1998;402.
8. Galan L., Montero I., Rueda F. Surf. Coat. Technol. 83:1996;103.
9. G. Beamson, D. Briggs, High Resolution XPS of Organic Polymers, The Scienta ESCA 300 Database, Wiley, Chichester, 1992, pp. 182-224.
10. A. de Graaf, personal communication.
11. Dementjev A.P., Petukhov M.N. Diamond Relat. Mater. 6:1997;486.
12. Dementjev A.P., Petukhov M.N. Diamond Relat. Mater. 7:1998;1534.
13. Waldrop J.R., Grant R.W., Wang Y.C., Davis R.F. J. Appl. Phys. 72:1992;4757.