Sonoelectrochemistry at tungsten-supported boron-doped CVD diamond electrodes

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 824-829

  Goeting, Christiaan H ^a   Foord, John S ^a   Marken, Frank ^a   Compton, Richard G ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

Author keywords

Diamond; Oxygen reduction; Plasma treatment; Sonoelectrochemistry; Tungsten

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; DOPING (ADDITIVES); ELECTROCHEMICAL ELECTRODES; PHOSPHATES; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; RUTHENIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SONOCHEMISTRY; TUNGSTEN;

DIAMOND FILM ELECTRODES; OXYGEN REDUCTION; SONOELECTROCHEMISTRY;

DIAMOND FILMS;

EID: 0032621360     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00278-7     Document Type: Article

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