Analysis of high-resolution X-ray diffraction in semiconductor strained layers

Journal of Applied Physics

Volumn 86, Issue 2, 1999, Pages 782-790

  Dunstan, D J ^a   Colson, H G ^a   Kimber, A C ^a,b  

^a QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

^b UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTOMETERS; EPITAXIAL GROWTH; SEMICONDUCTOR GROWTH; X RAY DIFFRACTION;

HIGH RESOLUTION X RAY DIFFRACTION; SEMICONDUCTOR STRAINED LAYERS;

SEMICONDUCTING FILMS;

EID: 0032620974     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370805     Document Type: Article

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