Simulation of coherent multiple imaging by means of pupil-plane filtering in optical microlithography

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 16, Issue 8, 1999, Pages 1909-1914

  Erdelyi M ^a   Bor, Z S ^a   Wilson, W L ^b   Smayling, M C ^b   Tittel, F K ^b  

^a JATE   (Hungary)

^b Rice University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ETALONS; FABRY-PEROT INTERFEROMETERS; IMAGE ENHANCEMENT; OPTICAL FILTERS; OPTICAL RESOLVING POWER; OPTICAL TRANSFER FUNCTION;

COHERENT MULTIPLE IMAGING; PUPIL-PLANE FILTERING;

PHOTOLITHOGRAPHY;

EID: 0032614497     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.16.001909     Document Type: Article

References (8)

1. M. Erdélyi, Z. L. Horváth, G. Szabo, Zs. Bor, F. K. Tittel, J. R. Cavallaro, and M. C. Smayling, “Generation of diffraction-free beams for application in optical microlithography,” J. Vac. Sci. Technol. B 15, 287–292 (1997).
2. Z. L. Horváth, M. Erdélyi, G. Szabo, Zs. Bor, F. K. Tittel, and J. R. Cavallaro, “Generation of nearly nondiffracting Bessel beams with a Fabry–Perot interferometer,” J. Opt. Soc. Am. A 14, 3009–3013 (1997).
3. M. Erdélyi, A. Kroyen, K. Osvay, Z. Bor, W. L. Wilson, M. C. Smayling, and F. K. Tittel, “Coherent multiple imaging by means of pupil plane filtering,” in Optical Microlitho graphy XII, L. van den Hove, ed., Proc. SPIE 3679, 439 (1999).
4. H. Fukuda, T. Terasawa, and S. Okazaki, “Spatial filtering for depth of focus and resolution enhancement in optical lithography,” J. Vac. Sci. Technol. B 9, 3113–3116 (1991).
5. R. von Bünau, G. Owen, and R. F. W. Pease, “Depth of focus enhancement in optical lithography,” J. Vac. Sci. Technol. B 10, 3047–3054 (1992).
6. T. Horiuchi, K. Harada, S. Matsuo, Y. Takeuchi, E. Tamechika, and Y. Mimura, “Resolution enhancement by oblique illumination optical lithography using a transmittance-adjusted pupil filter,” Jpn. J. Appl. Phys. 34, 1698–1708 (1995).
7. M. Erdélyi, Zs. Bor, G. Szabo, and F. K. Tittel, “Enhanced microlithography using coated objective and image duplication,” in Optical Microlithography XI, L. van den Hove, ed., Proc. SPIE 3334, 579–589 (1998).
8. Chris A. Mack, Inside Prolith™; a Comprehensive Guide to Optical Lithography Simulation (FINLE Technologies, Inc., Austin, Tex., 1997).