Enhanced microlithography using coated objectives and image duplication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 579-589

  Erdélyi, Miklós ^a   Bor, Zsolt ^a   Szabó, Gábor ^a   Tittel, Frank K ^b  

^a UNIVERSITY OF SZEGED   (Hungary)

^b Rice University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LITHOGRAPHY; REFRACTIVE INDEX;

AERIAL IMAGING; CONTACT HOLE (CH); EXIT PUPIL; PHASE RETARDATION (PR); PROCESS WINDOWS; PROJECTION LENSES; RESIST IMAGING; SIMULATION TOOLS; THICK PLATES; TRANSMISSION FILTERS; UNDESIRABLE EFFECTS; WAVE-OPTICS;

BIREFRINGENCE;

EID: 3342946800     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310787     Document Type: Conference Paper

References (11)

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