Generation of diffraction-free beams for applications in optical microlithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 287-292

  Erdelyi M ^a   Horvath Z L ^a   Szabo G ^a   Bor, Zs ^a   Tittel, F K ^b   Cavallaro, J R ^b   Smayling, M C ^c  

^a UNIVERSITY OF SZEGED   (Hungary)

^b Rice University   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; FABRY-PEROT INTERFEROMETERS; FUNCTIONS; IMAGING TECHNIQUES; LENSES; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY;

DEPTH OF FOCUS; NONDIFFRACTING BESSEL BEAMS; OPTICAL AXIS; OPTICAL MICROLITHOGRAPHY; PHASE SHIFTING METHOD;

LIGHT;

EID: 0038665536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589280     Document Type: Article

References (26)

1. J. Durnin, J. Opt. Soc. Am. 4, 651 (1987).
2. J. Durnin, J. J. Miceli, Jr., and J. H. Eberly, Phys. Rev. Lett. 58, 1499 (1987).
3. A. J. Cox and D. C. Dibble, J. Opt. Soc. Am. 9, 282 (1992).
4. G. Indebetouw, J. Opt. Soc. Am. 6, 150 (1989).
5. R. Arimoto, C. Saloma, T. Tanaka, and S. Kawata, Appl. Opt. 31, 6653 (1992).
6. J. Turunen, A. Vasara, and A. T. Friberg, Appl. Opt. 27, 3959 (1988).
7. A. J. Cox and D. C. Dibble, Appl. Opt. 30, 1330 (1991).
8. J. K. Jabczynski, Opt. Commun. 77, 292 (1990).
9. K. Uehara and H. Kikuchi, Appl. Phys. B 48, 125 (1989).
10. G. B. Airy, Philos. Mag. 18. 1 (1841).
11. G. S. Steward, Philos. Trans. R. Soc. London Ser. A 225, 131 (1926).
12. E. H. Linfoot and E. Wolf, Proc. Phys. Soc. London Sec. B 66, 145 (1953).
13. C. A. Taylor and B. J. Thompson, J. Opt. Soc. Am. 48, 844 (1958).
14. W. T. Welford, J. Opt. Soc. Am. 50, 749 (1960).
15. C. W. McCutchien, J. Opt. Soc. Am. 54, 240 (1964).
16. M. R. LaPointe, Proc. SPIE 1527, 258 (1991).
17. G. Häusler and W. Heckel, Appl. Opt. 27, 5165 (1988).
18. F. Schellenberg, M. D. Levenson, and P. J. Brock, Proc. SPIE 1604, 274 (1991).
19. Z. L. Horvath, M. Erdelyi, G. Szabo, Zs. Bor, F. K. Tittel, and J. R. Cavallaro (unpublished).
20. H. Fukuda, N. Hasegawa, and S. Okazaki, J. Vac. Sci. Technol. B 7, 667 (1989).
21. M. Born and E. Wolf. Principle of Optics. 6th ed. (Pergamon, New York, 1980), p. 397.
22. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, IEEE Trans. Electron Devices ED-29, 1828 (1982); M. D. Levenson, Jpn. J. Appl. Phys. 1 33, 6765 (1994).
23. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, IEEE Trans. Electron Devices ED-29, 1828 (1982); M. D. Levenson, Jpn. J. Appl. Phys. 1 33, 6765 (1994).
24. M. Shibuya, Japanese Patent No. Showa 62-50811 (30 September 1980).
25. H. Watanabe and Y. Todokoro, J. Vac. Sci. Technol. B 11, 2669 (1993).
26. M. Erdélyi, Zs. Bor, J. R. Cavallaro, G. Szabó, W. L. Wilson, C. Sengupta, M. C. Smayling, and F. K. Tittel, Jpn. J. Appl. Phys. 1 34, L1629 (1995).