Generation of diffraction-free beams for applications in optical microlithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 15, Issue 2, 1997, Pages 287-292

  Erdelyi M ^a   Horvath Z L ^a   Szabo G ^a   Bor, Zs ^a   Tittel, F K ^b   Cavallaro, J R ^b   Smayling, M C ^c  

^a UNIVERSITY OF SZEGED   (Hungary)

^b The NanoCarbon Center and Welch Institute for Advanced Materials   (United States)

^c TEXAS INSTRUMENTS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION; FABRY-PEROT INTERFEROMETERS; FUNCTIONS; IMAGING TECHNIQUES; LENSES; MATHEMATICAL MODELS; PHOTOLITHOGRAPHY;

DEPTH OF FOCUS; NONDIFFRACTING BESSEL BEAMS; OPTICAL AXIS; OPTICAL MICROLITHOGRAPHY; PHASE SHIFTING METHOD;

LIGHT;

EID: 0038665536     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589280     Document Type: Article

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