Chemical-mechanical polishing for polysilicon surface micromachining

Journal of the Electrochemical Society

Volumn 144, Issue 1, 1997, Pages 237-242

  Yasseen, A A ^a   Mourlas, N J ^a   Mehregany, M ^a  

^a Case Western Reserve University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DEPOSITION; DOPING (ADDITIVES); FILMS; MICROMACHINING; OXIDES; PHOSPHORUS; SILICON WAFERS; SURFACE ROUGHNESS; SURFACES;

CHEMICAL MECHANICAL POLISHING; POLYSILICON;

POLISHING;

EID: 0030784113     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837391     Document Type: Article

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