Fabrication of smooth β-SiC surfaces by reactive ion etching using a graphite electrode

Materials Science and Engineering B

Volumn 46, Issue 1-3, 1997, Pages 190-194

  Reichert, W ^a   Stefan, D ^a   Obermeier, E ^a   Wondrak, W ^b  

^a TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^b DAIMLER AG   (Germany)

Author keywords

Flourinated gas; Ion etching; Micromasking

Indexed keywords

ALUMINUM; COMPOSITION EFFECTS; GRAPHITE ELECTRODES; OXYGEN; PLASMAS; PRESSURE EFFECTS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SULFUR COMPOUNDS; SURFACE ROUGHNESS;

MICROMASKING;

SILICON CARBIDE;

EID: 0031122664     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(96)01961-7     Document Type: Article

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