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Volumn 175, Issue 1, 1999, Pages 405-412
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Characterization of deposited nanocrystalline silicon by spectroscopic ellipsometry
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
CHEMICAL VAPOR DEPOSITION;
ELLIPSOMETRY;
NANOSTRUCTURED MATERIALS;
SCANNING ELECTRON MICROSCOPY;
TRANSMISSION ELECTRON MICROSCOPY;
LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);
SPECTROSCOPIC ELLIPSOMETRY;
SEMICONDUCTING SILICON;
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EID: 0032594831
PISSN: 00318965
EISSN: None
Source Type: Journal
DOI: 10.1002/(SICI)1521-396X(199909)175:1<405::AID-PSSA405>3.0.CO;2-U Document Type: Article |
Times cited : (6)
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References (13)
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