Comparison of (Ba,Sr)TiO3thin films from metallorganic chemical vapor deposition with Ti(dmae)4and Ti(i-OPr)2(tmhd)2as Ti sources

Electrochemical and Solid-State Letters

Volumn 2, Issue 10, 1999, Pages 507-509

  Lee, Jung Hyun ^a   Kim, Joo Young ^a   Rhee, Shi Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATION; BARIUM TITANATE; DECOMPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLATINUM; SILICA; SILICON; STRONTIUM COMPOUNDS; TANTALUM COMPOUNDS;

DIRECT LIQUID INJECTION; STRONTIUM TITANATE;

DIELECTRIC FILMS;

EID: 0032594223     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390885     Document Type: Article

References (5)

1. P. C. Fazan, Integr. Ferroelectr., 4, 247 (1994).
2. W. J. Lee, C. Basceri, S. K. Streiffer, A. I. Kingon, and D. Y. Yang, Thin Solid Films, 323, 285 (1998).
3. T. Kawahara, M. Yamamuka, T. Makita, and Y. Matsui, Jpn. J. Appl. Phys., 33, 5897 (1998).
4. C. S. Kang, H. J. Cho, C. S. Hwang, B. T. Le, K-H. Lee, H. Horii, W. D. Kim, S. I. Lee, and M. Y. Lee, Jpn. J. Appl. Phys., 36, 6946 (1997).
5. J. H. Lee, M. Y. Park, and S. W. Rhee, Chem. Mater., Submitted.