Preparation of (Ba, Sr)TiO3 thin films by chemical vapor deposition using liquid sources

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 33, Issue 10, 1994, Pages 5897-5902

  Kawahara, Takaaki ^a   Yamamuka, Mikio ^a   Makita, Tetsuro ^a   Tsutahara, Koichiro ^a   Yuuki, Akimasa ^a   Ono, Kouichi ^a   Matsui, Yasuji ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; CAPACITORS; CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRIC PROPERTIES; FILM PREPARATION; LEAKAGE CURRENTS; LSI CIRCUITS; NOZZLES; ORGANOMETALLICS; VAPORIZATION;

BARIUM STRONTIUM TITANATE; BIS DIPIVALOYLMETHANATO BARIUM; BIS DIPIVALOYLMETHANATO STRONTIUM; DIELECTRIC CONSTANT; DIELECTRIC LOSS; FILM THICKNESS; SHOWER TYPE NOZZLE; STEP COVERAGE; TRENCH ANALYSIS; VAPORIZER;

THIN FILMS;

EID: 0028532245     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)