Effects of methyl and perfluoro-alkyl groups on water repellency of silicon oxide films prepared by microwave plasma-enhanced chemical vapor deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4959-4963

  Hozumi, Atsushi ^a   Kondo, Takahiro ^a   Kajita, Iwao ^a   Sekoguchi, Hiroki ^a   Sugimoto, Nobuhisa ^a   Takai, Osamu ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Contact angle; Microwave; Optical emission spectroscopy; Plasma enhanced chemical vapor deposition; Water repellency

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CONTACT ANGLE; EMISSION SPECTROSCOPY; FILM PREPARATION; FLUORINE COMPOUNDS; MICROWAVES; ORGANOMETALLICS; PLASMA APPLICATIONS; PROTECTIVE COATINGS; SILANES;

FLUORO ALKYL SILANE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; WATER REPELLENCY;

SEMICONDUCTING FILMS;

EID: 0031177255     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4959     Document Type: Article

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