Damage formation in InP due to high electronic excitation by swift heavy ions

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 146, Issue 1-4, 1998, Pages 341-349

  Wesch, W ^a   Herre, O ^b   Gaiduk, P I ^b   Wendler, E ^a   Klaumunzer S ^c   Meier, P ^c  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b BELARUSIAN STATE UNIVERSITY   (Belarus)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINE MATERIALS; CRYSTALLIZATION; ELECTRON ENERGY LEVELS; ELECTRONIC PROPERTIES; HEAVY IONS; RADIATION DAMAGE; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING INDIUM PHOSPHIDE; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRONIC ENERGY DEPOSITION; HIGH ELECTRONIC EXCITATION; SWIFT HEAVY ION; THERMAL SPIKE;

ION BOMBARDMENT;

EID: 0032477027     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(98)00435-2     Document Type: Article

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