Imaging interferometric lithography for arbitrary patterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3331, Issue , 1998, Pages 214-224

  Chen, Xiaolan ^a   Brueck, S R J ^a  

^a UNIVERSITY OF NEW MEXICO   (United States)

Author keywords

Arbitrary patterns; Imaging interferometric lithography; Superresolution

Indexed keywords

INTERFEROMETRY; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS;

IMAGING INTERFEROMETRIC LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 0032401436     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.309621     Document Type: Conference Paper

References (14)

1. Precision improvement in optical proximity correction by optimizing second illumination source shape
2. Improving resolution in photolithography with a phase-shifting mask
3. Photolithography system using annular illumination
4. Optical system with resolving power exceeding the classical limit
5. Can synthetic aperture techniques be applied to optical lithography?
6. Holographic lithography with thick resist
7. High aspect-ratio holographic photoresist gratings
8. Interferometric lithography exposure tool for 180-nm structures
9. Process development for 180-nm structures using interferometric lithography and i-line photoresists
10. Field emitter array mask patterning using laser interference lithography
11. Interferometric lithography of sub-micrometer sparse hole array for field-emission application
12. Multiple-exposure interferometric lithography
13. Interferometric lithography pattern delimited by a mask image