Can synthetic aperture techniques be applied to optical lithography?

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 4162-4166

  Fukuda, Hiroshi ^a   Von Bunau, Rudolf M ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0010406246     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588612     Document Type: Article

References (4)

1. M. D. Levenson, N. S. Viswanathan, and R. A. Simpson, IEEE Trans. Electron Devices ED-29, 1828 (1982).
2. W. Lukosz, J. Opt. Soc. Am. 57, 163 (1968).
3. M. Noguchi, M. Muraki, Y. Iwasaki, and A. Suzuki, Proc. SPIE 1674, 105 (1992).
4. N. Siraishi, S. Hirukawa, Y. Takeuchi, and N. Magome, Proc. SPIE 1674, 741 (1992).