Developing a method to determine linewidth based on counting the atom-spacings across a line

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 441-460

  Silver, R M ^a   Jensen, C P ^a   Tsai, V ^a   Fu, J ^a   Villarrubia, J ^a   Teague, E C ^a  

^a DANISH FUNDAMENTAL METROLOGY   (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; IMAGING TECHNIQUES; OXIDATION; PASSIVATION; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SOFTWARE PROTOTYPING; ULTRAHIGH VACUUM;

ATOM SPACINGS;

SEMICONDUCTING SILICON;

EID: 0032401384     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308754     Document Type: Conference Paper

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