Accuracy and traceability in dimensional measurements

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3332, Issue , 1998, Pages 471-479

  Potzick, James ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Accuracy; Measurement; Measurement traceability; Measurement uncertainty

Indexed keywords

MASKS; PARTICLE SIZE ANALYSIS; PRODUCT DEVELOPMENT; STANDARDS;

PHOTOMASKS;

PHOTOLITHOGRAPHY;

EID: 0032402923     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.308758     Document Type: Conference Paper

References (16)

1. Guidelines for evaluating and expressing the uncertainty of NIST measurement results
2. Photomask metrology in the era of neolithography
3. Accuracy in integrated circuit dimensional measurements
4. The international system of units (SI)
5. Mise en pratique of the definition of the meter (1992)
6. NIST length scale interferometer measurement assurance
7. National voluntary laboratory accreditation program (NVLAP), procedures and general requirements
8. Antireflecting-chromium linewidth standard, SRM 473, for calibration of optical microscope linewidth measuring systems
9. New NIST-certified small scale pitch standard
10. Scanning electron microscope-based metrological electron microscope system and new prototype scanning electron microscope magnification standard