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Volumn 14, Issue 6, 1996, Pages
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Developing a haze and microroughness reference standard
a
a
VLSI Standards
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(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
HAZE;
MICROROUGHNESS;
OPTICAL PROFILOMETERS;
POWER SPECTRAL DENSITY;
REFERENCE STANDARD;
SCANNING SURFACE INSPECTION SYSTEMS;
SURFACE PROFILER SYSTEMS;
WAFER SCANNERS;
ATOMIC FORCE MICROSCOPY;
CALIBRATION;
ETCHING;
FOURIER TRANSFORMS;
INSPECTION EQUIPMENT;
LIGHT SCATTERING;
ROUGHNESS MEASUREMENT;
SILICON WAFERS;
SPECTRUM ANALYSIS;
STANDARDS;
TEXTURES;
TRANSFER FUNCTIONS;
SURFACE ROUGHNESS;
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EID: 18344415865
PISSN: 10810595
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
Times cited : (1)
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References (13)
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