Feature scale simulation studies of TEOS-sourced remote microwave plasma-enhanced chemical vapor deposition of silicon dioxide: Role of oxygen atom recombination

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 3, 1996, Pages 977-983

  Virmani, Moneth ^a   Levedakis, Dimitri A ^a   Raupp, Gregory B ^a   Cale, Timothy S ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0009719929     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580066     Document Type: Article

References (19)

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14. EVOLVE is a low pressure deposition simulator developed by T. S. Cale at ASU and Motorola, Inc. with funding from the SRC and NSF.
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