Diagnostics of plasma for metal-organic chemical vapour deposition of Cu and fabrication of Cu thin films using the plasma

Journal of Physics D: Applied Physics

Volumn 29, Issue 11, 1996, Pages 2754-2758

  Shiratani, Masaharu ^a   Kawasaki, Hiroharu ^a   Fukuzawa, Tsuyoshi ^a   Kinoshita, Toshio ^a   Watanabe, Yukio ^a  

^a KYUSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; COMPOSITION EFFECTS; HYDROGEN; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PLASMA APPLICATIONS; PLASMA DIAGNOSTICS; THIN FILMS;

DILUTION;

COPPER;

EID: 0030285180     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/29/11/005     Document Type: Article

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