Boron incorporation with and without atomic hydrogen during the growth of doped layers on Si(100)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 16, Issue 4, 1998, Pages 2619-2624

  Silvestre, Conrad ^a   Thompson, Phillip ^a   Jernigan, Glenn ^a   Simons, David ^b  

^a NAVAL RESEARCH LABORATORY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0032346651     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581414     Document Type: Article

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