Testing of optical materials for 193-nm applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3427, Issue , 1998, Pages 411-418

  Liberman, V ^a   Rothschild, M ^a   Sedlacek, J H C ^a   Uttaro, R S ^a   Grenville, A ^a   Bates, A K ^a   Van Peski, C ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

193 nm lithography; Absorption; Antireflective coatings; Densification; Laser induced damage

Indexed keywords

ANTIREFLECTION COATINGS; CALCIUM COMPOUNDS; DENSIFICATION; FUSED SILICA; LASER DAMAGE; LASER PULSES;

IMAGING OPTICS;

LITHOGRAPHY;

EID: 0032224622     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328512     Document Type: Conference Paper

References (16)

1. The X-ray compaction of vitreous silica
2. The effect of gamma-irradiation on the density of various types of silica
3. The radiation compaction of vitreous silica
4. Volume, index-of-refraction, and stress changes in electronirradiated vitreous silica
5. Compaction of ion-implanted fused silica
6. Mechanism for the radiation compaction of vitreous silica
7. Densification of synthetic fused silica under ultraviolet irradiation
8. Densification of fused silica under 193 nm excitation
9. Ultraviolet-induced densification in fused silica
10. Investigation of the absorption induced damage in ultraviolet dielectric thin films
11. Materials for optical coatings in the ultraviolet
12. Testing of the durability of single-crystal calcium fluoride with and without antireflection coatings for use with high-power KrF excimer lasers
13. Stability of optical interference coatings exposed to low-fluence 193 nm ArF radiation
14. Sudden onset of strong absorption followed by forced recovery in KrF laser-irradiated fused silica
15. Assessment of optical coatings for 193-nm lithography