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Volumn 418, Issue 1, 1998, Pages 181-209

Reactive scattering study of etching dynamics: Cl2 on GaAs(100)

(6) Bond, P a Brier, P N a Fletcher, J a Jia, W J a Price, H a Gorry, P A a

a UNIVERSITY OF MANCHESTER (United Kingdom)

Author keywords

Chemisorption; Chlorine; Etching; Gallium arsenide; Molecule solid reactions; Molecule solid scattering and diffraction Inelastic; Physical adsorption; Surface chemical reaction

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; CHEMISORPTION; CHLORINE COMPOUNDS; DESORPTION; ETCHING; MOLECULAR BEAMS; SCATTERING; THERMAL EFFECTS;

ARRHENIUS PLOTS; THERMAL ETCHING;

SEMICONDUCTING GALLIUM ARSENIDE;

EID: 0032205562 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(98)00715-8 Document Type: Article

Times cited : (17)

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