Fundamental studies of halogen reactions with III-V semiconductor surfaces

Annual Review of Physical Chemistry

Volumn 47, Issue , 1996, Pages 527-554

  Simpson, William C ^a   Yarmoff, Jory A ^b  

^a PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

^b NONE

Author keywords

Chlorine; Fluorine, etching; Gallium arsenide; Semiconductor processing

Indexed keywords

EID: 0000311372     PISSN: 0066426X     EISSN: None     Source Type: Book Series    
DOI: 10.1146/annurev.physchem.47.1.527     Document Type: Article

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