Effects of defect propagation/growth on in-line defect-based yield prediction

IEEE Transactions on Semiconductor Manufacturing

Volumn 11, Issue 4, 1998, Pages 546-551

  Shindo, Wataru ^a,d   Nurani, Raman K ^b   Strojwas, Andrzej J ^c,d  

^a TOHOKU UNIVERSITY   (Japan)

^b KLA TENCOR CORPORATION   (United States)

^c CARNEGIE MELLON UNIVERSITY   (United States)

^d IEEE   (Japan)

Author keywords

Critical area; Defect growth; Defect propagation; In line inspection; Yield model; Yield prediction

Indexed keywords

CRACK PROPAGATION; CRYSTAL DEFECTS; FORECASTING; MATHEMATICAL MODELS;

IN LINE INSPECTION; YIELD MODEL; YIELD PREDICTION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0032203439     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.728550     Document Type: Article

References (6)

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