Trace and ultratrace analysis of gallium arsenide by different mass spectrometric techniques

Journal of Analytical Atomic Spectrometry

Volumn 13, Issue 9, 1998, Pages 983-987

  Becker, Johanna Sabine ^a   Soman, Rajiv S ^b   Becker, Thomas ^c   Panday, Vijay K ^d   Dietze, Hans Joachim ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b 705 Engineering Research Center   (United States)

^c RUHR UNIVERSITY BOCHUM   (Germany)

^d Intl Environmental Consulting   (India)

Author keywords

Gallium arsenide; Inductively coupled plasma mass spectrometry; Solid state mass spectrometry; Trace analysis

Indexed keywords

CHLORINATION; DISSOLUTION; GLOW DISCHARGES; HYDROGEN PEROXIDE; ION IMPLANTATION; LASER ABLATION; NITRIC ACID; PLASMA DIAGNOSTICS; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTOR DOPING; TRACE ANALYSIS;

GLOW DISCHARGE MASS SPECTROMETRY (GDMS); INDUCTIVELY COUPLED PLASMA MASS SPECTROMETRY (ICP MS); MATRIX SEPARATION; SPARK SOURCE MASS SPECTROMETRY (SSMS); ULTRATRACE ANALYSIS;

MASS SPECTROMETRY;

EID: 0032163021     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/a801525b     Document Type: Article

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