Analysis of GaAs using a combined r.f. glow discharge and inductively coupled plasma source mass spectrometer

International Journal of Mass Spectrometry and Ion Processes

Volumn 164, Issue 1-2, 1997, Pages 81-91

  Backer, J S ^a   Saprykin, A I ^b   Dietze, H J ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

Double focusing sector field mass spectrometer; GaAs; ICP MS; R.f. GDMS

Indexed keywords

EID: 30844438948     PISSN: 01681176     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0168-1176(97)00021-9     Document Type: Article

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