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Applied Physics A: Materials Science and Processing

Volumn 67, Issue 3, 1998, Pages 295-301

Chemical characterization of as-deposited microcrystalline indium oxide films prepared by reactive dc magnetron sputtering

(5) Xirouchaki, C a,b Moschovis, K a Chatzitheodoridis, E a Kiriakidis, G a Morgen, P b

a UNIVERSITY OF CRETE (Greece)

b UNIVERSITY OF SOUTHERN DENMARK (Denmark)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; FILM GROWTH; FILM PREPARATION; MAGNETRON SPUTTERING; OXYGEN; SEMICONDUCTING INDIUM COMPOUNDS; SPUTTER DEPOSITION; STOICHIOMETRY; SURFACE CHEMISTRY;

DEPTH PROFILING ANALYSIS; INDIUM OXIDE;

SEMICONDUCTING FILMS;

EID: 0032156166 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390050774 Document Type: Article

Times cited : (6)

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