-
1
-
-
0030409312
-
-
J. De Blauwe, J. Van Houdt, D. Wellekens, R. Degraeve, Ph. Roussel, L. Haspeslagh, L. Deferm, G. Groeseneken, and H. E. Maes, A new quantitative model to predict SILC-related disturb characteristics in Flash E2PROM devices, in IEDM Tech. Dig., 1996, pp. 343-346.
-
A New Quantitative Model to Predict SILC-related Disturb Characteristics in Flash E2PROM Devicesin IEDM Tech. Dig., 1996, Pp. 343-346.
-
-
De Blauwe, J.1
Van Houdt, J.2
Wellekens, D.3
Degraeve, R.4
Roussel, P.5
Haspeslagh, L.6
Deferm, L.7
Groeseneken, G.8
Maes, H.E.9
-
3
-
-
0027591522
-
-
vol. 81, pp. 776-788, May 1993.
-
S. Aritome, R. Shirota, G. Hemink, T. Endoh, and F. Masuoka, Reliability issues of flash memory cells, in Proc. IEEE, vol. 81, pp. 776-788, May 1993.
-
Reliability Issues of Flash Memory Cellsin Proc. IEEE
-
-
Aritome, S.1
Shirota, R.2
Hemink, G.3
Endoh, T.4
Masuoka, F.5
-
4
-
-
0029701168
-
-
B. Maiti, D. Shum, W. Paulson, K. Chang, P. J. Tobin, M. Weidner, and C. Kuo, Highly reliable furnace-grown N2U tunnel oxide for a microcontroller with embedded Flash EEPROM, in Proc. Int. Ret. Phys. Symp., 1996, pp. 55-60.
-
Highly Reliable Furnace-grown N2U Tunnel Oxide for A Microcontroller with Embedded Flash EEPROMin Proc. Int. Ret. Phys. Symp., 1996, Pp. 55-60.
-
-
Maiti, B.1
Shum, D.2
Paulson, W.3
Chang, K.4
Tobin, P.J.5
Weidner, M.6
Kuo, C.7
-
5
-
-
0030686899
-
-
J. Kirn, J. D. Choi, W. C. Shin, D. J. Kim, H. S. Kim, K. M. Mang, S. T. Ahn, and O. H. Kwon, Scaling down of tunnel oxynitride in NAND Flash memory: oxynitride selection and reliabilities, in Proc. Int. Rel. Phys. Symp., 1997, pp. 12-16.
-
Scaling Down of Tunnel Oxynitride in NAND Flash Memory: Oxynitride Selection and Reliabilitiesin Proc. Int. Rel. Phys. Symp., 1997, Pp. 12-16.
-
-
Kirn, J.1
Choi, J.D.2
Shin, W.C.3
Kim, D.J.4
Kim, H.S.5
Mang, K.M.6
Ahn, S.T.7
Kwon, O.H.8
-
6
-
-
0027803216
-
-
vol. 40, pp. 2255-2263, Dec. 1993.
-
J. Van Houdt, L. Haspeslagh, D. Wellekens, L. Deferm, G. Groeseneken, and H. E. Maes, HIMOS-A high efficiency flash E2PROM cell for embedded memory applications, IEEE Trans. Electron. Devices, vol. 40, pp. 2255-2263, Dec. 1993.
-
HIMOS-A High Efficiency Flash E2PROM Cell for Embedded Memory ApplicationsIEEE Trans. Electron. Devices
-
-
Van Houdt, J.1
Haspeslagh, L.2
Wellekens, D.3
Deferm, L.4
Groeseneken, G.5
Maes, H.E.6
-
8
-
-
0028755689
-
-
M. Kato, N. Miyamoto, H. Kume, A. Satoh, T. Adachi, M. Ushiyama, and K. Kimura, Read-disturb degradation mechanism due to electron trapping in the tunnel oxide for low-voltage Flash memories, in IEDM Tech. Dig., 1994, pp. 45-48.
-
Read-disturb Degradation Mechanism Due to Electron Trapping in the Tunnel Oxide for Low-voltage Flash Memoriesin IEDM Tech. Dig., 1994, Pp. 45-48.
-
-
Kato, M.1
Miyamoto, N.2
Kume, H.3
Satoh, A.4
Adachi, T.5
Ushiyama, M.6
Kimura, K.7
-
10
-
-
0024125531
-
-
vol. 35, pp. 2259-2267, Dec. 1988.
-
P. Olivo, T. N. Nguyen, and B. Riccö, High-field induced degradation in ultra-thin SiC>2, IEEE Trans. Electron Devices, vol. 35, pp. 2259-2267, Dec. 1988.
-
High-field Induced Degradation in Ultra-thin SiC>2IEEE Trans. Electron Devices
-
-
Olivo, P.1
Nguyen, T.N.2
Riccö, B.3
-
13
-
-
84920731904
-
-
J. De Blauwe, R. Degraeve, J. Van Houdt, Ph. Roussel, G. Groeseneken, and H. E. Maes, Study of DC stress induced leakage current (SILC) and its dependence on oxide nitridation, in Proc. 26th ESSDERC, 1996, pp. 361-364.
-
Study of DC Stress Induced Leakage Current (SILC) and Its Dependence on Oxide Nitridationin Proc. 26th ESSDERC, 1996, Pp. 361-364.
-
-
De Blauwe, J.1
Degraeve, R.2
Van Houdt, J.3
Roussel, P.4
Groeseneken, G.5
Maes, H.E.6
|