Visible photoluminescence in carbon-implanted thermal SiO2 films

Physica Status Solidi (A) Applied Research

Volumn 168, Issue 2, 1998, Pages 531-534

  Yu, Y H ^a,b   Wong, S P ^b   Wilson, I H ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CHINESE UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; CARBON; HIGH RESOLUTION ELECTRON MICROSCOPY; ION IMPLANTATION; PHOTOLUMINESCENCE; SILICA;

THERMAL FILMS;

SEMICONDUCTING FILMS;

EID: 0032140472     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/(SICI)1521-396X(199808)168:2<531::AID-PSSA531>3.0.CO;2-V     Document Type: Article

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