Real time control of etch rate and selectivity using two colors laser interferometry

IEEE International Conference on Plasma Science

Volumn , Issue , 1996, Pages 281-

  Sarfaty, M ^a   Breun, R ^a   Hershkowitz, N ^a   Baum, C ^a   Nagpal, K ^a   Vincent, T ^a   Khargonekar, P P ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER BEAMS; PLASMA CONFINEMENT; PLASMA ETCHING; SIGNAL INTERFERENCE; SURFACES; THICKNESS MEASUREMENT; THIN FILMS;

ETCH RATE; MAGNETICALLY CONFINED INDUCTIVELY COUPLED PLASMA; REAL TIME CONTROL; TWO COLORS LASER INTERFEROMETRY;

INTERFEROMETRY;

EID: 0029703144     PISSN: 07309244     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (0)