The effects of in-situ pretreatments of the substrate surface on the properties of PLZT films fabricated by a multi-target sputtering method

Thin Solid Films

Volumn 324, Issue 1-2, 1998, Pages 101-106

  Kim, Hyun Ho ^a   Kim, Sung Tae ^b   Lee, Won Jong ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b SAMSUNG Electronics   (South Korea)

Author keywords

Interfacial layer; PLZT film; Pretreatment; Sputtering

Indexed keywords

COMPOSITION EFFECTS; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; GRAIN SIZE AND SHAPE; LEAD COMPOUNDS; NUCLEATION; SPUTTER DEPOSITION; SUBSTRATES; SURFACE TREATMENT;

LEAD ZIRCONATE TITANATE; MULTI TARGET SPUTTERING METHOD;

DIELECTRIC FILMS;

EID: 0032121782     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01214-5     Document Type: Article

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