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Volumn 37, Issue 7, 1998, Pages 3878-3881
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Characteristics of Mg-doped GaN and AlGaN grown by H2-ambient and N2-ambient metalorganic chemical vapor deposition
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Author keywords
Acceptor concentration; Carrier concentration; Group III nitrides; N2 ambient metalorganic chemical vapor deposition; p type doping; Uniformity
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Indexed keywords
MANGANESE;
METALLORGANIC CHEMICAL VAPOR DEPOSITION;
NITRIDES;
SEMICONDUCTING ALUMINUM COMPOUNDS;
SEMICONDUCTOR DOPING;
ACCEPTOR CONCENTRATION;
SEMICONDUCTING GALLIUM COMPOUNDS;
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EID: 0032115305
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.37.3878 Document Type: Article |
Times cited : (17)
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References (11)
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