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Volumn 37, Issue 7, 1998, Pages 3878-3881

Characteristics of Mg-doped GaN and AlGaN grown by H2-ambient and N2-ambient metalorganic chemical vapor deposition

Author keywords

Acceptor concentration; Carrier concentration; Group III nitrides; N2 ambient metalorganic chemical vapor deposition; p type doping; Uniformity

Indexed keywords

MANGANESE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NITRIDES; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTOR DOPING;

EID: 0032115305     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.3878     Document Type: Article
Times cited : (17)

References (11)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.