Ion beam smoothing of CVD diamond thin films by etchback method

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 121, Issue 1-4, 1997, Pages 191-194

  Kiyohara, Shuji ^a   Miyamoto, Iwao ^a   Masaki, Takashi ^a   Honda, Satoshi ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ION BEAMS; ION BOMBARDMENT; IONS; REACTIVE ION ETCHING; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION;

ION BEAM EFFECTS;

INDUSTRIAL DIAMONDS;

EID: 0031546175     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(96)00545-9     Document Type: Article

References (7)

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4. D.-G. Lee and R. K. Singh, Mat. Res. Soc. Symp. Proc. 354 (1995) 699.
5. S. Matsumoto, Y. Sato, M. Kamo and N. Setaka, Japan. J. Appl. Phys. 21 (1982) L183.
6. T. Suganuma, J. Electron Microsc. 34 (1985) 328.
7. S. Kiyohara and I. Miyamoto, JSPE Publication Series No.1, Advancement of Intelligent Production, 7th ICPE, 4th ICHT (1994) p. 576.