Simultaneous real-time study of initial hillocking and changes in overall stress in evaporated Al films during heating

Journal of Materials Research

Volumn 13, Issue 6, 1998, Pages 1666-1671

  Kylner, C ^a,b   Mattsson, L ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b ACREO AB   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; ELECTRON BEAMS; EVAPORATION; HEAT TREATMENT; LASER BEAM EFFECTS; LIGHT SCATTERING; SILICON WAFERS; SURFACE ROUGHNESS; THERMAL EFFECTS;

INITIAL HILLOCKING;

OPTICAL FILMS;

EID: 0032097646     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1998.0230     Document Type: Article

References (21)

1. R. A. Schwarzer and D. Gerth. J. Electron Mater. 22 (6), 607 (1993).
2. L. Mattsson, Y-H. Le Page, and F. Ericsson, Thin Solid Films 198, 149 (1991).
3. V. M. Koleshko, V. F. Belitsky, and I. V. Kiryushin, Thin Solid Films 142, 199 (1986).
4. M. D. Thouless, J. Gupta, and J. M. E. Harper, J. Mater. Res. 8, 1845 (1993).
5. W. D. Nix, Metall. Trans. 20A, 2217 (1989).
6. A. K. Sinha, H. J. Levinstein, and T. E. Smith, J. Appl. Phys. 49 (4), 2423 (1978).
7. P. A. Flinn, D. S. Gardner, and W. D. Nix, IEEE Trans. Electron Dev. ED-34 (3), 689 (1987).
8. P. A. Flinn, in Thin Films: Stresses and Mechanical Properties, edited by J. C. Bravman, W. D. Nix, D. M. Barnett, and D. A. Smith (Mater. Res. Soc. Symp. Proc. 130, Pittsburgh, PA, 1989), p. 41.
9. M. Hershkovitz, I. A. Blech, and Y. Komem, Thin Solid Films 130, 87 (1985).
10. D. S. Gardner and P. A. Flinn, IEEE Trans. Electron Dev. 35 (12), 2160 (1988).
11. C. Kylner and L. Mattsson, in Thin Films: Stresses and Mechanical Properties VI, edited by W. W. Gerberich, H. Gao, J-E. Sundgren, and S. P. Baker (Mater. Res. Soc. Symp. Proc. 436, Pittsburgh, PA, 1996), p. 257.
12. C. Kylner and L. Mattsson, Rev. Sci. Instrum. 68 (1), 143 (1997).
13. J. M. Bennett and J. H. Dancy, Appl. Opt. 20 (10), 1785 (1981).
14. L. Mattsson, in Thin Film Technologies, edited by J. R. Jacobsson (Proc. SPIE 652, 1986), p. 264.
15. G. G. Stoney, Proc. R. Soc. London A 82, 172 (1909).
16. W. D. Nix, private communication.
17. R. Venkatraman and J. C. Bravman, J. Mater. Res. 7, 2040 (1992).
18. M. F. Doerner, D. S. Gardner, and W. D. Nix, J. Mater. Res. 1, 845 (1986).
19. J. Turlo, Ph.D. Thesis, Stanford University, 1992.
20. C. Kylner and L. Mattsson, Thin Solid Films 307, 169 (1997).
21. M. F. Doerner and W. D. Nix, Crit. Rev. Solid State Mater. Sci. 14 (3), 225 (1988).