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Thin Solid Films

Volumn 307, Issue 1-2, 1997, Pages 169-177

Initial development of the lateral hillock distribution in optical quality Al thin films studied in real time

(2) Kylner, C a Mattsson, L b

a ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

b ACREO AB (Sweden)

Author keywords

Aluminum; Heat treatment; Light scattering; Optical coatings

Indexed keywords

ALUMINUM; CHARGE COUPLED DEVICES; COMPUTATIONAL METHODS; DATA ACQUISITION; HEAT TREATMENT; IMAGE PROCESSING; LIGHT SCATTERING; REAL TIME SYSTEMS; SILICON WAFERS; STRESS CONCENTRATION; THERMAL EFFECTS;

LATERAL HILLOCK DISTRIBUTION; PARTIAL INTEGRATED SCATTERING (PIS) SYSTEMS; QUADRATE COUNTS METHOD;

OPTICAL FILMS;

EID: 0031248402 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00315-5 Document Type: Article

Times cited : (13)

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