Formation of β-C3N4 phase in C-N films deposited by reactive ionized cluster beam method

Materials Letters

Volumn 27, Issue 4-5, 1996, Pages 219-223

  Feng, Jiayou ^a   Zheng, Yi ^a   Xie, Junqing ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

C N films; Deposition; Reactive ionized cluster beam method; C3N4 phase

Indexed keywords

ACTIVATED CARBON; AMMONIA; CHARACTERIZATION; CHEMICAL BONDS; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; NITRIDES; NITROGEN; POLYETHYLENES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILM MATRIX; BETA CARBON NITRIDE PHASE; CARBON NITRIDE THIN FILMS; ELECTRON DIFFRACTION ANALYSIS; REACTIVE IONIZED CLUSTER BEAM METHOD; WEAK POLARIZED COVALENT BOND;

THIN FILMS;

EID: 0030192168     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-577X(95)00288-X     Document Type: Article

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