Deposition time influence on cubic boron nitride thin films by tuned rf magnetron sputtering

Thin Solid Films

Volumn 317, Issue 1-2, 1998, Pages 376-379

  Gimeno, S ^a   Munoz J C ^a   Lousa, A ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Boron nitride; Deposition time; Rf magnetron sputtering

Indexed keywords

CRYSTALLINE MATERIALS; CUBIC BORON NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SILICON; SINTERING; TRANSMISSION ELECTRON MICROSCOPY; VACUUM APPLICATIONS;

DEPOSITION TIME; RADIO FREQUENCY MAGNETRON SPUTTERING; VACUUM CHAMBERS;

THIN FILMS;

EID: 0032048081     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00627-5     Document Type: Article

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