Reactive ion etching of silicon containing polynorbornenes

Journal of the Electrochemical Society

Volumn 145, Issue 4, 1998, Pages 1257-1262

  Zhao, Qiang ^a,b   Kohl, Paul A ^a,b  

^a Georgia Institute of Technology   (United States)

^b ELECTROCHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DIELECTRIC MATERIALS; FLUORINE COMPOUNDS; OXYGEN; PLASMAS; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUOROFORM; POLYNORBORNENES;

ORGANIC POLYMERS;

EID: 0032048041     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838448     Document Type: Article

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