Investigation of polyimide residue due to reactive ion etching in O2

Journal of the Electrochemical Society

Volumn 143, Issue 4, 1996, Pages 1464-1469

  Tsang, Y L ^a   Miller, C ^a   Lii, T ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; CLEAN ROOMS; CONTAMINATION; OXYGEN; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SURFACES; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; LOW LEVEL METAL CONTAMINATION; POLYIMIDE RESIDUE; THIN RESIDUAL GRASS LIKE FILM;

POLYIMIDES;

EID: 0030129494     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1836660     Document Type: Article

References (13)

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