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Volumn 136-138, Issue , 1998, Pages 654-660

Quantitative compositional depth profiling of Si1-x-yGexCy thin films by simultaneous elastic recoil detection and Rutherford backscattering spectrometry

Author keywords

Depth profiles; ERD TOF; Microstructures; RBS; Si1 x yGexCy; TEM; XRD; XTEM

Indexed keywords

AMORPHOUS MATERIALS; ION BEAMS; ION BOMBARDMENT; POLYCRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SINGLE CRYSTALS; SPUTTER DEPOSITION; STACKING FAULTS; THIN FILMS; TWINNING;

EID: 0032019285     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00881-1     Document Type: Article
Times cited : (2)

References (31)
  • 27
    • 0012388507 scopus 로고
    • E. Sacher, J.J. Pireaux, S.P. Kowalczyk (Eds.), Metallization of Polymers, ch. 6
    • S.C. Gujrathi, in: E. Sacher, J.J. Pireaux, S.P. Kowalczyk (Eds.), Metallization of Polymers, ch. 6, ACS Symp. Series No. 440. 1990, p. 88.
    • (1990) ACS Symp. Series No. 440 , vol.440 , pp. 88
    • Gujrathi, S.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.