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Volumn 118, Issue 1-4, 1996, Pages 560-565
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ERD-TOF characterization of silicon-compound multilayer and graded-index optical coatings
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Author keywords
[No Author keywords available]
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Indexed keywords
AMORPHOUS FILMS;
CHARACTERIZATION;
CHEMICAL VAPOR DEPOSITION;
DENSITY (OPTICAL);
FABRICATION;
ION BOMBARDMENT;
MICROSTRUCTURE;
MULTILAYERS;
OPTICAL FILMS;
OPTIMIZATION;
REFRACTIVE INDEX;
SILICON COMPOUNDS;
DEPTH PROFILE;
ELASTIC RECOIL DETECTION;
GAS FLOW RATIOS;
GAS MIXTURES;
GRADED INDEX OPTICAL COATINGS;
PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION;
TIME OF FLIGHT TECHNIQUE;
OPTICAL COATINGS;
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EID: 0030565054
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/0168-583X(95)01117-X Document Type: Article |
Times cited : (14)
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References (27)
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