Gas-phase etching of sacrificial oxides using anhydrous HF and CH3OH

Proceedings of the IEEE Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 1997, Pages 448-453

  Lee, Jong Hyun ^a   Lee, Yong Il ^a   Jang, Won Ick ^a   Lee, Chang Seung ^a   Yoo, Hyung Joun ^a  

^a Electronics and Telecommunications Research Institute (ETRI)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; HYDROFLUORIC ACID; METHANOL; OXIDES; PHASE INTERFACES; SEMICONDUCTING POLYMERS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

CAPILLARY FORCE; GAS PHASE ETCHING; TETRAETHYLORTHOSILICATE OXIDE;

MICROELECTROMECHANICAL DEVICES;

EID: 0030674252     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (17)