Proximity x-ray lithography as a quick replication technique in nanofabrication: Recent progress and perspectives

Microelectronic Engineering

Volumn 30, Issue 1-4, 1996, Pages 191-194

  Chen, Y ^a   Rousseaux, F ^a   Haghiri Gosnet, A M ^a   Kupka, R K ^a   Ravet, M F ^a   Simon, G ^a   Launois, H ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELECTRONS; MASKS; MATHEMATICAL MODELS; MICROELECTRONIC PROCESSING; MONTE CARLO METHODS; NANOTECHNOLOGY; SYNCHROTRON RADIATION;

AUGER ELECTRONS; ENERGY DEPOSITION; GRUEN RANGE; PHOTOELECTRONS; QUICK REPLICATION TECHNIQUE; X RAY STEPPER;

X RAY LITHOGRAPHY;

EID: 0029732736     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00224-3     Document Type: Article

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