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Journal of Non-Crystalline Solids

Volumn 209, Issue 3, 1997, Pages 240-246

Deposition and characterization of dense and stable amorphous hydrogenated boron films at low substrate temperatures

(3) Annen, A a Beckmann, R a Jacob, W a

a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

BORON COMPOUNDS; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; COMPOSITION; CRYSTAL STRUCTURE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; ION BEAMS; PLASMA APPLICATIONS; STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED BORON FILM; CHEMICAL STABILITY; ION BEAM ANALYSIS; RADIO FREQUENCY PLASMA CHEMICAL VAPOR DEPOSITION; THERMAL DESORPTION SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0031078688 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-3093(96)00568-6 Document Type: Article

Times cited : (19)

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