메뉴 건너뛰기




Volumn 14, Issue 4, 1996, Pages 2574-2581

Metal stack etching using a helical resonator plasma

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0001554616     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588770     Document Type: Article
Times cited : (17)

References (20)
  • 4
    • 24644522578 scopus 로고
    • edited by S. M. Sze McGraw-Hill, New York, Chap. 9
    • D. B. Fraser, in VLSI Technology, edited by S. M. Sze (McGraw-Hill, New York, 1983), Chap. 9.
    • (1983) VLSI Technology
    • Fraser, D.B.1
  • 11
    • 24644498802 scopus 로고    scopus 로고
    • Prototech Research, Inc. of Tempe, Arizona
    • Prototech Research, Inc. of Tempe, Arizona.
  • 12
    • 24644474367 scopus 로고    scopus 로고
    • Lucas Labs, Inc. of Sunnyvale, California
    • Lucas Labs, Inc. of Sunnyvale, California.
  • 13
    • 24644446686 scopus 로고    scopus 로고
    • Monolite Instruments of Leominster, Massachusetts
    • Monolite Instruments of Leominster, Massachusetts.
  • 14
    • 24644481686 scopus 로고    scopus 로고
    • Low Entropy Systems of Somerville, Massachusetts
    • Low Entropy Systems of Somerville, Massachusetts.
  • 15
    • 24644459605 scopus 로고    scopus 로고
    • ACT-CMI is a proprietary organic etchant produced by Advanced Chemical Technologies of Allentown, PA
    • ACT-CMI is a proprietary organic etchant produced by Advanced Chemical Technologies of Allentown, PA.
  • 20
    • 24644488051 scopus 로고    scopus 로고
    • personal communication
    • A. Kornblit (personal communication).
    • Kornblit, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.