Lithographic evaluation of a DUV carbon attenuated phase shift mask

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 107-110

  Callegan, A C ^a   Babich, K ^a   Purushothaman, S ^a   Mansfield, S ^b   Ferguson, R ^b   Wong, A ^b   Adair, W ^b   O'Grady, D ^b   Chao, V ^b  

^a IBM T J WATSON RESEARCH CENTER   (United States)

^b IBM   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; FABRICATION; FILMS; LITHOGRAPHY; OPTICS; PERFORMANCE; PHOTORESISTS;

DUV;

MASKS;

EID: 0031655223     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0167-9317(98)00023-9     Document Type: Article

References (8)

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