-
1
-
-
0029775493
-
Reduction of CD variance by using optical proximity correction for patterning with DUV phase shift mask
-
Jan
-
H. Zhang, "Reduction of CD variance by using optical proximity correction for patterning with DUV phase shift mask", Microelectron. Eng. (Netherlands) 30, pp. 119-22, Jan. 1996.
-
(1996)
Microelectron. Eng. (Netherlands)
, vol.30
, pp. 119-122
-
-
Zhang, H.1
-
2
-
-
0029214803
-
-
C. N. Ahn, K. H Baik., Y. S. Lee, H. E. Kim, I. B. Hur, Y. S. Kim, J. H. Kim, S. H, Choi, A study of optical proximity effects using off axis illumination with attenuated phase shift mask, Proc. SPIE - Int. Soc. Opt. Eng. (USA) 2440, pp. 222-39, 1995.
-
C. N. Ahn, K. H Baik., Y. S. Lee, H. E. Kim, I. B. Hur, Y. S. Kim, J. H. Kim, S. H, Choi, "A study of optical proximity effects using off axis illumination with attenuated phase shift mask", Proc. SPIE - Int. Soc. Opt. Eng. (USA) 2440, pp. 222-39, 1995.
-
-
-
-
3
-
-
62249165832
-
-
V. Chi Min Yuan Pol, J. Garofalo, C. Pierrat, Implementing attenuated phase shift masks for contacts in production, Jpn. J. Appl. Phys. 1, Regul. Pap. Short Notes (Japan) 33, pp. 6796-800, Dec. 1994.
-
V. Chi Min Yuan Pol, J. Garofalo, C. Pierrat, "Implementing attenuated phase shift masks for contacts in production", Jpn. J. Appl. Phys. 1, Regul. Pap. Short Notes (Japan) 33, pp. 6796-800, Dec. 1994.
-
-
-
-
4
-
-
62249133017
-
-
R. Martino, R. Ferguson, L. Liebman, M. Neisser, J. Weed, A. Callegari, Lithographic evaluations of the hydrogenated amorphous carbon film, J. Vac. Sci. Techn. 13, pp. 2949-53, EIPB '95, Scottsdale, AZ 1995.
-
R. Martino, R. Ferguson, L. Liebman, M. Neisser, J. Weed, A. Callegari, "Lithographic evaluations of the hydrogenated amorphous carbon film", J. Vac. Sci. Techn. 13, pp. 2949-53, EIPB '95, Scottsdale, AZ 1995.
-
-
-
-
5
-
-
0029519721
-
Deep UV attenuated phase shift mask for a quarter micron photolithography
-
S. Kyoh, H. Sakurai, T. Iwamatsu, I. Higashikawa, R. Taniguchi, H. Watanabe, T.Tuchiya, "Deep UV attenuated phase shift mask for a quarter micron photolithography", Proc. SPIE - Int. Soc. Opt. Eng. (USA) 2621, pp. 300-9, 1995.
-
(1995)
Proc. SPIE - Int. Soc. Opt. Eng. (USA)
, vol.2621
, pp. 300-309
-
-
Kyoh, S.1
Sakurai, H.2
Iwamatsu, T.3
Higashikawa, I.4
Taniguchi, R.5
Watanabe, H.6
Tuchiya, T.7
-
6
-
-
0029239022
-
Effect of pattern density for contact windows in an attenuated phase shift mask
-
I. B. Hur, J. H. Kim, I. H. Lee, H. E. Kim, C. N Ahn, K. H. Baik, S. H.Choi, "Effect of pattern density for contact windows in an attenuated phase shift mask", Proc. SPIE - Int. Soc. Opt. Eng. (USA) 2440, pp. 278-89, 1995.
-
(1995)
Proc. SPIE - Int. Soc. Opt. Eng. (USA)
, vol.2440
, pp. 278-289
-
-
Hur, I.B.1
Kim, J.H.2
Lee, I.H.3
Kim, H.E.4
Ahn, C.N.5
Baik, K.H.6
Choi, S.H.7
-
7
-
-
62249191387
-
Interferometer for phase measurements in phase shift masks
-
SPIE, Sunnyvale Ca, Sept
-
D.B. Dove, T.C. Chieu, and A.P. Ghosh, "Interferometer for phase measurements in phase shift masks", Proc. 12th Annual BACUS, SPIE, Sunnyvale Ca., Sept. 1992.
-
(1992)
Proc. 12th Annual BACUS
-
-
Dove, D.B.1
Chieu, T.C.2
Ghosh, A.P.3
-
8
-
-
62249217250
-
-
n&k Technology, Inc, Santa Clara, California 95054
-
n&k Technology, Inc., Santa Clara, California 95054.
-
-
-
-
9
-
-
62249086353
-
-
U. S. Patent No. 4,905,170
-
A. R. Forohui and I. Bloomer, U. S. Patent No. 4,905,170, 1990.
-
(1990)
-
-
Forohui, A.R.1
Bloomer, I.2
-
10
-
-
0009260463
-
Optical dispersion relations for amorphous semiconductors and amorphous dielectrics
-
A. R. Forohui and I. Bloomer, "Optical dispersion relations for amorphous semiconductors and amorphous dielectrics", Phys. Rev. B, 34, pp. 7018-7025, 1986.
-
(1986)
Phys. Rev. B
, vol.34
, pp. 7018-7025
-
-
Forohui, A.R.1
Bloomer, I.2
-
11
-
-
25944452908
-
Optical properties of crystalline semiconductors and dielectrics
-
A. R. Forohui and I. Bloomer, "Optical properties of crystalline semiconductors and dielectrics", Phys. Rev. B, 38, No. 3, pp. 1865-1874, 1988.
-
(1988)
Phys. Rev. B
, vol.38
, Issue.3
, pp. 1865-1874
-
-
Forohui, A.R.1
Bloomer, I.2
-
12
-
-
0022102547
-
Optical properties of rough thin films
-
J. Szcrzyrbowski, "Optical properties of rough thin films", Thin Solid Films 130, pp. 57-73, 1985.
-
(1985)
Thin Solid Films
, vol.130
, pp. 57-73
-
-
Szcrzyrbowski, J.1
-
14
-
-
0002107443
-
Optical properties of hydrogenated carbon film for phase shift mask applications
-
A. Callegari, A. Pomerene, H. Hovel, E. Babich, S. Purushothaman,and J. Shaw, "Optical properties of hydrogenated carbon film for phase shift mask applications", J. Vac. Sci. Technol. B, 8, pp. 2697-2699,1993.
-
(1993)
J. Vac. Sci. Technol. B
, vol.8
, pp. 2697-2699
-
-
Callegari, A.1
Pomerene, A.2
Hovel, H.3
Babich, E.4
Purushothaman, S.5
Shaw, J.6
-
15
-
-
0010345807
-
Thermal Stability and Electrical Properties of Hydrogenated Carbon Film
-
A. Callegari, D.A. Buchanan, H. Hovel, E. Simonyi, A. Marwick, N.E. Lustig, "Thermal Stability and Electrical Properties of Hydrogenated Carbon Film", App. Phys. Lett. 65, pp. 3200-3202, 1994.
-
(1994)
App. Phys. Lett
, vol.65
, pp. 3200-3202
-
-
Callegari, A.1
Buchanan, D.A.2
Hovel, H.3
Simonyi, E.4
Marwick, A.5
Lustig, N.E.6
|